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Deep reinforcement learning optimized double exponentially weighted moving average controller for chemical mechanical polishing processes
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Deep reinforcement learning optimized double exponentially weighted moving average controller for chemical mechanical polishing processes (2023)Deep reinforcement learning optimized dou…Adaptive Cautious Regularized Run-to-Run Controller for Lithography Process (2021)Adaptive Cautious Regularized…A New Double Exponentially Weighted Moving Average Run-to-Run Control Using a Disturbance-Accumulating Strategy for Mixed-Product Mode (2020)A New Double Exponentially We…AN ANALYSIS AND MIMO EXTENSION OF A DOUBLE EWMA RUN-TO-RUN CONTROLLER FOR NON-SQUARED SYSTEMS (2003)AN ANALYSIS AND MIMO EXTENSIO…Run by run process control: combining SPC and feedback control (1995)Response Surface Methodology (1996)Response Surface Methodology (1996)A Multiresolution Analysis-Assisted Reinforcement Learning Approach to Run-by-Run Control (2007)An Intelligent Run-to-Run Control Strategy for Chemical–Mechanical Polishing Processes (2010)Double EWMA controller using neural network-based tuning algorithm for MIMO non-squared systems (2011)Stability and Sensitivity of an EWMA Controller (1993)Run-to-Run Process Control: Literature Review and Extensions (1997)Stability analysis of double EWMA run-to-run control with metrology delay (2002)Overlay Error Compensation Using Advanced Process Control With Dynamically Adjusted Proportional-Integral R2R Controller (2013)
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References

  • 2003AN ANALYSIS AND MIMO EXTENSION OF A DOUBLE EWMA RUN-TO-RUN CONTROLLER FOR NON-SQUARED SYSTEMS29 cited
  • 2021Adaptive Cautious Regularized Run-to-Run Controller for Lithography Process24 cited
  • 2020A New Double Exponentially Weighted Moving Average Run-to-Run Control Using a Disturbance-Accumulating Strategy for Mixed-Product Mode23 cited

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