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Age-based double EWMA controller and its application to CMP processes

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References

1977Time Series Analysis: Forecasting and Control19,200 cited
1997Statistical control by monitoring and feedback adjustment382 cited
1995Run by run process control: combining SPC and feedback control325 cited
1997Run-to-Run Process Control: Literature Review and Extensions222 cited

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2002A multivariate double EWMA process adjustment scheme for drifting processes77 cited
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2023Reinforcement learning for process control with application in semiconductor manufacturing27 cited
2020A New Double Exponentially Weighted Moving Average Run-to-Run Control Using a Disturbance-Accumulating Strategy for Mixed-Product Mode23 cited
2004A time-varying weights tuning method of the double EWMA controller22 cited
2009A General Harmonic Rule Controller for Run-to-Run Process Control21 cited
2010A G&P EWMA algorithm for high-mix semiconductor manufacturing processes18 cited
2013Process adjustment with an asymmetric quality loss function18 cited
2011A Bayesian framework for online parameter estimation and process adjustment using categorical observations

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16 cited

2017Performance Analysis of Double EWMA Controller Under Dynamic Models With Drift15 cited

2010Online parameter estimation and run-to-run process adjustment using categorical observations13 cited

2005An Initial Intercept Iteratively Adjusted (IIIA) Controller: An Enhanced Double EWMA Feedback Control Scheme13 cited

2015A Multivariate EWMA Controller for Linear Dynamic Processes12 cited

2009Stability analysis of single EWMA controller under dynamic models12 cited

2008EWMA run-to-run controllers with gain updating: Stability and sensitivity analysis12 cited