Age-based double EWMA controller and its application to CMP processes

A.L.P. Chen · Ruey‐Shan Guo

128 citations0/0 files storedIEEE Transactions on Semiconductor Manufacturing

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Advanced Statistical Process Monitoring Management and Optimization Techniques Fault Detection and Control Systems

Abstract

In the originally proposed run-by-run control scheme, the EWMA statistic is used as an estimate of the process deviation from its target. However, the controller based on the EWMA statistic is not sufficient for controlling a wearing out process. The PCC controller has been thus proposed to enhance the run-by-run controller capability. In this paper, we first reexamine the fundamentals of the PCC formulations and propose an adjustment that is advantageous in controlling processes subject to both random shifts and drifts. The adjusted PCC controller is then further refined to take into account the process age. This age-based double EWMA scheme is then applied to the CMP process, which is known in the semiconductor industry to be rather unstable.

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1977Time Series Analysis: Forecasting and Control 1997Statistical control by monitoring and feedback adjustment 1995Run by run process control: combining SPC and feedback control 1997Run-to-Run Process Control: Literature Review and Extensions

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