Run-to-Run Process Adjustment Using Categorical Observations

Kaibo Wang · Fugee Tsung

33 citations0/0 files storedJournal of Quality Technology

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Advanced Statistical Process Monitoring Control Systems and Identification Fault Detection and Control Systems

Abstract

When quality characteristics cannot be measured on a continuous scale due to either inherent or outside constraints, qualitative observations can be collected alternatively. Under this situation, most conventional run-to-run (R2R) process-control algorithms that are developed based on quantitative measurements cannot be implemented. In this paper, we develop a run-to-run control scheme that uses qualitative information for process adjustments. A two-phase modeling and adjustment strategy is introduced and demonstrated by a real example from a deep reactive ion etching (DRIE) process: model building and parameter estimation is performed in Phase I, and a latent-model control law, a categorical R2R controller, is developed for process regulation in Phase II. Simulation results show that the proposed algorithm exhibits competitive control performance, less adjustment effort, and a larger stability region than the conventional exponentially weighted moving average (EWMA) controller.

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References

2001Experiments - Planning, Analysis and Parameter Design Optimization 2004Response Surface Methodology: A Retrospective and Literature Survey 2001Experiments: Planning, Analysis, and Parameter Design Optimization 1995Run by run process control: combining SPC and feedback control 1993Stability and Sensitivity of an EWMA Controller 1997Run-to-Run Process Control: Literature Review and Extensions 1999Integrated design of run-to-run PID controller and SPC monitoring for process disturbance rejection 2003A study of variable ewma controller

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2009A Review of Statistical Methods for Quality Improvement and Control in Nanotechnology 2009A General Harmonic Rule Controller for Run-to-Run Process Control 2013Process adjustment with an asymmetric quality loss function 2013A batch-based run-to-run process control scheme for semiconductor manufacturing 2011A Bayesian framework for online parameter estimation and process adjustment using categorical observations

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